Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures

dc.contributor.author	Oettel, Martin
dc.date.accessioned	2018-03-27T08:53:18Z
dc.date.available	2018-03-27T08:53:18Z
dc.date.issued	2017
dc.identifier.issn	1520-8559
dc.identifier.uri	http://hdl.handle.net/10900/81151
dc.language.iso	en	de_DE
dc.publisher	A V S Amer Inst Physics	de_DE
dc.relation.uri	http://dx.doi.org/10.1116/1.4971196	de_DE
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.ddc	530	de_DE
dc.subject.ddc	600	de_DE
dc.title	Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures	de_DE
dc.type	Article	de_DE
utue.quellen.id	20170815222223_02440
utue.personen.roh	Schwille, Matthias C.
utue.personen.roh	Schoessler, Timo
utue.personen.roh	Barth, Jonas
utue.personen.roh	Knaut, Martin
utue.personen.roh	Schoen, Florian
utue.personen.roh	Hoechst, Arnim
utue.personen.roh	Oettel, Martin
utue.personen.roh	Bartha, Johann W.
dcterms.isPartOf.ZSTitelID	Journal of Vacuum Science & Technology A	de_DE
dcterms.isPartOf.ZS-Issue	Article 01B118	de_DE
dcterms.isPartOf.ZS-Volume	35	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE