Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures

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dc.contributor.author Oettel, Martin
dc.date.accessioned 2018-03-27T08:53:18Z
dc.date.available 2018-03-27T08:53:18Z
dc.date.issued 2017
dc.identifier.issn 1520-8559
dc.identifier.uri http://hdl.handle.net/10900/81151
dc.language.iso en de_DE
dc.publisher A V S Amer Inst Physics de_DE
dc.relation.uri http://dx.doi.org/10.1116/1.4971196 de_DE
dc.rights info:eu-repo/semantics/closedAccess
dc.subject.ddc 530 de_DE
dc.subject.ddc 600 de_DE
dc.title Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures de_DE
dc.type Artikel de_DE
utue.quellen.id 20170815222223_02440
utue.personen.roh Schwille, Matthias C.
utue.personen.roh Schoessler, Timo
utue.personen.roh Barth, Jonas
utue.personen.roh Knaut, Martin
utue.personen.roh Schoen, Florian
utue.personen.roh Hoechst, Arnim
utue.personen.roh Oettel, Martin
utue.personen.roh Bartha, Johann W.
dcterms.isPartOf.ZSTitelID Journal of Vacuum Science & Technology A de_DE
dcterms.isPartOf.ZS-Issue Article 01B118 de_DE
dcterms.isPartOf.ZS-Volume 35 de_DE
utue.fakultaet 07 Mathematisch-Naturwissenschaftliche Fakultät de_DE


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