Electronic Structure and Stability of Fluorophore-Nitroxide Radicals from Ultrahigh Vacuum to Air Exposure

dc.contributor.author	Kakavandi, Reza
dc.contributor.author	Savu, Sabine-Antonia
dc.contributor.author	Casu, Maria Benedetta
dc.date.accessioned	2015-04-15T07:54:10Z
dc.date.available	2015-04-15T07:54:10Z
dc.date.issued	2015
dc.identifier.issn	1944-8244
dc.identifier.uri	http://hdl.handle.net/10900/62767
dc.language.iso	en	de_DE
dc.publisher	Amer Chemical Soc	de_DE
dc.relation.uri	http://dx.doi.org/10.1021/am508854u	de_DE
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject.ddc	600	de_DE
dc.title	Electronic Structure and Stability of Fluorophore-Nitroxide Radicals from Ultrahigh Vacuum to Air Exposure	de_DE
dc.type	Article	de_DE
utue.quellen.id	20150402110707_00276	de_DE
utue.publikation.seiten	1685-1692	de_DE
utue.personen.roh	Kakavandi, R.
utue.personen.roh	Ravat, P.
utue.personen.roh	Savu, S-A
utue.personen.roh	Borozdina, Y. B.
utue.personen.roh	Baumgarten, M.
utue.personen.roh	Casu, M. B.
dcterms.isPartOf.ZSTitelID	Acs Applied Materials & Interfaces	de_DE
dcterms.isPartOf.ZS-Issue	3	de_DE
dcterms.isPartOf.ZS-Volume	7	de_DE
utue.fakultaet	07 Mathematisch-Naturwissenschaftliche Fakultät	de_DE