J(Si,H) Coupling Constants of Activated Si-H Bonds

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dc.contributor.author Eichele, Klaus
dc.date.accessioned 2019-04-24T12:34:47Z
dc.date.available 2019-04-24T12:34:47Z
dc.date.issued 2017
dc.identifier.issn 1089-5639
dc.identifier.uri http://hdl.handle.net/10900/88024
dc.language.iso en de_DE
dc.publisher Amer Chemical Soc de_DE
dc.relation.uri http://dx.doi.org/10.1021/acs.jpca.7b05830 de_DE
dc.rights info:eu-repo/semantics/closedAccess
dc.subject.ddc 530 de_DE
dc.subject.ddc 540 de_DE
dc.title J(Si,H) Coupling Constants of Activated Si-H Bonds de_DE
dc.type Artikel de_DE
utue.quellen.id 20190131163842_01095
utue.publikation.seiten 7219-7235 de_DE
utue.personen.roh Meixmer, Petra
utue.personen.roh Batke, Kilian
utue.personen.roh Fischer, Andreas
utue.personen.roh Schmitz, Dominik
utue.personen.roh Eickerling, Georg
utue.personen.roh Kalter, Marcel
utue.personen.roh Ruhland, Klaus
utue.personen.roh Eichele, Klaus
utue.personen.roh Barquera-Lozada, Jose E.
utue.personen.roh Casati, Nicola P. M.
utue.personen.roh Montisci, Fabio
utue.personen.roh Macchi, Piero
utue.personen.roh Scherer, Wolfgang
dcterms.isPartOf.ZSTitelID Journal of Physical Chemistry A de_DE
dcterms.isPartOf.ZS-Issue 38 de_DE
dcterms.isPartOf.ZS-Volume 121 de_DE
utue.fakultaet 07 Mathematisch-Naturwissenschaftliche Fakultät de_DE


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